Extreme Ultraviolet (EUV) Lithography: Enabling The Next Generation Of High-Performance Computing
One of the main advantages of Extreme Ultraviolet (EUV) Lithography is its ability to produce smaller and more complex circuits, which are essential for developing faster and more powerful microchips. The EUV light has a much shorter wavelength than traditional lithography techniques, which allows it to achieve much higher resolution. The wavelength of EUV light is around 13.5 nanometers, compared to the 193-nanometer wavelength of the most advanced ultraviolet lithography techniques used today.
This allows Extreme Ultraviolet (EUV) Lithography to create features as small as 7 nanometers or even smaller, which is essential for producing advanced microchips. Another advantage of EUV lithography is its ability to improve the yield of the production process. The yield is the percentage of functional chips produced compared to the total number of chips manufactured. With traditional lithography techniques, the yield can be negatively impacted by various factors, such as defects in the photoresist or misalignment of the mask.
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