CMP Slurry : From Abrasive Particles To Nanoscale Polishing Agents
Solvents: Solvents are used to dissolve the chemical reagents and provide a medium for the abrasive particles to disperse evenly in the slurry. The choice of solvent depends on the chemical nature of the reagents and the desired viscosity of the slurry. Some of the commonly used solvents include water, ethylene glycol, and isopropyl alcohol. Stabilizers: Stabilizers are added to the CMP Slurry...
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