Extreme-Ultraviolet-Lithography: Challenges and Future Prospects
Extreme ultraviolet lithography (EUVL) is a cutting-edge technology used in the semiconductor industry to manufacture integrated circuits. It employs extreme ultraviolet (EUV) light with a wavelength of 13.5 nanometers to create intricate patterns on silicon wafers. This process is crucial for producing the latest generations of microchips, enabling the continuation of Moore’s...
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